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HHV Scancoat Six, Auto306, Auto500 and TF600 deposition systems. Manufactured using technology licensed from Edwards Ltd
   
 
HHV Scancoat Six HHV Auto306 HHV Auto500 HHV Auto500 Glove Box HHV TF600
         
    HHV Auto500. The multi-purpose deposition system for research & development  
 

 

The HHV Auto500 multi purpose deposition system

The HHV Auto500 is a versatile front-loading deposition system for researchers or those  working in pre-production. The chamber can accommodate large-diameter substrates and allows a combination of resistance evaporation, electron beam and sputtering techniques to be performed without breaking vacuum. Pumping system options include a diffusion pump, conventional or dry-running mag-lev turbo pumps plus a cryo pump.

Auto500 system for resistance and electron beam deposition
Auto500 offers researchers a capable but affordable tool for thermal deposition techniques.

Process accessories

  • 400mm wide and 500mm wide stainless steel box chambers with options for water cooling
  • Glass bell jar or glass cylinder chambers
  • Single or multiple resistance sources, four position turret resistance source
  • 3kW or 6kW multi-pocket electron beam source
  • Static and rotary work holders
  • High temperature substrate heating systems
  • Source shutters and substrate shutters
  • Glow discharge cleaning
  • Film thickness monitoring and control systems
  • Load lock options
HHV Auto306 with FL400 box chamber
HHV Auto306 with FL400 box chamber
Interior of FL400 chamber showing EB3 electron beam source,
two resistance sources and quartz lamp substrate heater. 		The EB3 compact 3kW electron beam source with turret and liner options .
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Auto500 system for DC and RF sputtering
The Auto500 can be configured as a capable and versatile sputtering system for research. The systems can be fitted with up to three sputter sources while a versatile switching system allows users to select operation from DC or RF power supplies. The range of options includes process gas systems and work holders to provide maximum process flexibility.

 

Available options include

  • Up to three magnetron sources for upwards deposition
  • Gimballed sources for focused sputtering
  • Sequential or co-sputtering options
  • DC and RF power supply options
  • Reactive sputtering
  • Heated work holders
  • Biased work holders
  • Load lock options

FL500 chamber with three, 3” diameter sputter sources with tilting heads .
Auto500 for multi-process applications  
The versatile Auto500 can be configured for multi-technique applications. The spacious FL500 chamber can accommodate the compact EB3, 3kW electron beam source with sputtering and resistance sources to provide researchers with the means to create multi layer films using different techniques without breaking vacuum. The system can also accommodate glow discharge cleaning and substrate heating plus film thickness monitoring and control.
  Interior of FL500 chamber showing EB3 electron beam source plus two 75mm magnetron sputtering sources
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Auto500 features

Vacuum systems

  • 600l/s diffusion pump
  • 500l/s turbo molecular pump
  • 450l/s dry-running mag-lev turbo molecular pump
  • 1500l/s cryo pump
  • 14.3m3/h oil sealed rotary pump and liquid nitrogen trap as standard.
  • Option for dry-running scroll pump


Chambers

  • FL400 front loading ‘box’ chamber. 400mm diameter x 500mm tall with 100mm diameter viewport and chamber liners
  • FL500 front loading ‘box’ chamber. 500mm diameter x 500mm tall with 100mm diameter viewport and chamber liners
  • Water-cooled FL400 or FL500 chambers for use with high temperature substrate heating

Controls and safety

  • PLC system controller with touch-screen for vacuum system
  • control Automatic high vacuum valve protects pumps and process
  • Comprehensive interlocks to maximise operator safety
  • The Auto500 carries the CE mark

Future upgrades

  • A feature of the modular design of the Auto500 is that the system can be re-configured or upgraded with additional accessories as requirements change over time
Auto500 dimensions in mm (inches)
Control rack of a typical Auto500 DC and RF sputter deposition system
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