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The HHV Auto306 for Research and Development
Offering a choice of vacuum systems, chambers and thermal deposition accessories the HHV Auto306 can be configured to meet a wide range of requirements in the R&D laboratory.
- Glass bell jar, glass cylinder or stainless steel box chamber options
- Single or multiple resistance sources
- Four position turret resistance source
- EB3 compact 3kW, four-pocket electron beam source
- Temperature controlled sources for organic electronic materials
- Combination electron beam and resistance evaporation systems
- Static and rotary work holders
Substrate heating systems
- Source shutters
Glow discharge cleaning
- Film thickness monitoring
We are also pleased to discuss customised solutions for those users who have more exacting requirements.
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